Dongfang Jingyuan Electron Limited

Provider of yield management solutions in integrated circuit field!

About us

Dongfang Jingyuan Electron Co., Ltd. was established in 2014, headquartered in Beijing Yizhuang Economic and technological Development Zone. The company focuses on integrated circuit production management. Since its establishment, the company has been insisting on innovation research and development 191 domestic and foreign invention patents, 67 authorized invention patents and 15 software copyrights have been declared. And 26 registered trademarks. As a talent of high-tech enterprises is fundamental. 70% of the total number of R&D personnel, of which 8% are doctorates and 53% are masters.Core members have product development and management experience in the world's top semiconductor technology companies located in Silicon Valley, Japan and Europe.

Company Advantage

Internationalization Team

Independent Intellectual Property

International Cooperation

Product Introduction

EBI
CD-SEM

EBI

Electron-Beam Inspection(EBI), it is a key device for improving yield in the chip manufacturing process. SEpA-i series are used for the mainstream process of 300mm wafer. With advanced electron beam imaging system, high-speed XY stage and powerful data server, the system can obtain, high-resolution images. Combined with defect detection and automatic defect classification (ADC) algorithms, the system provide high-precision defect detection and yield enhancement solution for the chip manufacturing process.

CD-SEM

Critical Dimension-Scanning Electron Microscope, it is a key equipment for quality control in the chip manufacturing process. SEpA®-c series can use for 200mm/300mm silicon wafer process. Through advanced electron beam imaging system and high-speed silicon wafer transmission scheme, and precise measurement algorithm, the equipment can realize the key dimension measurement with high repeatability, high resolution and high throughput.